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Advanced Semiconductor Plating – Key Fundamentals
Process Application Note #100 – This paper provides background fundamentals of electrochemical deposition (ECD) in the semiconductor industry for engineers, technicians, and other personnel involved in plating processes. See Summary Overview
Electroplating Fundamentals – Optimizing Cross-wafer
Process Application Note #101 – This paper presents the basic principles and methodologies for helping process engineers to achieve optimized cross-wafer uniformity in semiconductor electroplating. It provides guidance for users of different plating systems. See Summary Overview