Electroplating and Wet Processing for Advanced Microelectronics

Advanced Packaging

Solstice delivers high-throughput, cost-effective electroplating tailored for advanced packaging applications — perfect for redistribution layers, under-bump metallization, and microbumps.

Copper RDL Plating

Copper Pillar Plating

Multi Metal Stack Pillar

Seed and Barrier Etch

Solstice’s single-wafer wet etch capabilities offer precise, uniform seed and barrier layer removal.

UBM and Patterned Metal Wet Etch

Solvent Processing

Solstice supports precision solvent processes like photoresist strip and metal lift-off with faster, safer and cleaner single wafer process design.

Photoresist Strip Process

Metal Lift-Off

Back End Cleans

With advanced single-wafer cleans, Solstice efficiently removes post-etch residues and contamination — critical for yield in compound and power devices.

RCA Cleans (SC1/SC2)

Piranha (SPM)

Advanced Gold Plating

Solstice enables uniform, high-purity gold plating with tight uniformity and high step coverage — optimized for RF, sensor, and high-reliability applications.

Gold TWV Plating

Gold Bond Pad

Through Mask Gold Plating

Gold Deplating

Fine Feature Gold Fill

Emerging Technologies

From photonics to advanced sensors, Solstice’s configurable platform adapts quickly to new processes—accelerating development without sacrificing performance.

TGVs

Indium Bump Plating

Hybrid Bonding

Glass Interposers

Visit us at CS Mantech!

May 18-21, 2026 | Portland, OR