Trident™ Spin Rinse Dryers

Spin Rinse Dryesr (SRD) for 75-200mm Substrates

The Trident family of Spin Rinse Dryers (SRDs) provides the state of the art in cleaning, rinsing and drying wafers after wet processing. The systems' non-contact heating results in cleaner N2 because it places a filter after the heater and eliminates direct contact between N2 and heater.

Trident SRDs also use ultra-pure valves and fittings throughout, and all systems include a comprehensive facility panel to precisely control all pressures and flows. These are typical of the design advances and efficiencies that give Trident Spin Rinse Dryer its uniquely attractive performance-to-price value.

ClassOne Trident Spin Rinse Dryers are available in bench-top and roll-around single-stack units and in dual-stack configurations, for processing up to 50 substrates per batch in sizes of 75mm to 200mm, depending upon the model, bowl size and rotor used.

Key Features

  • Stainless Steel Cabinetry
  • Negative-Pressure Motor Seal
  • Non-Contact Ultra-Pure N2 Heater
  • Uniform Water Spray
  • Full-Control Facility Panel
  • Door-top DC Ionizer
  • Full Wrap-Around Bowl Heater
  • PLC Control with Color Touch Screen

Major Benefits

  • FM4910 compliance
  • Much cleaner seal, reduced particles
  • Cleaner N2
  • Uniform rinse, no nozzle replacement
  • Precise control of flows and pressures
  • Reduced particles
  • Optimum drying performance
  • All Spin Rinse Dryer components readily available

Processes

  • Spin, Rinse, and Dry semiconductor wafers without leaving water spots and films after a wet process
  • Chemical or residue removal
  • Cleaning up to 200mm wafers utilizing DI Water Rinse, followed by heated N2 dry

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