Solstice SP LT
Surface Prep Development Systems
Semi-automated single-wafer Process
Development – with up to three chambers
Smarter, easier surface prep process development
The Solstice® SP LT is a full-featured, easy-to-use process development tool for wafer surface preparation as well as ECD applications on 200mm and smaller substrates. The SP LT is engineered to deliver class-leading performance and exceptional operational flexibility. The unique Solstice platform enables it to handle a broad spectrum of surface preparation processes, from high-pressure metal lift-off to spray acid applications such as UBM etch, and much more. With the addition of an ECD chamber, it can perform plating processes, as well.
The Solstice SP LT features manual wafer loading and automated processing.
The Solstice SP LT accommodates up to three chambers for manual-load, semi-automated process development, or low-volume production. It may be configured with two chambers or two chambers plus one additional chamber on the side, which is the Solstice SP LT3.
All SP LT systems feature automated recipe execution and use the same software and controls and the same selection of chambers as the Solstice SP4 and SP8. This provides a natural, easy route for scaling up to automated production as the user expands capacity. No retraining is needed.
Streamlining your path to automated plating
The Solstice SP LT gives wet bench users an attractive and affordable entry point to the benefits of advanced, automated plating and surface preparation, with major improvements in consistency, throughput, and safety – all with state-of-the-art features and control in a very compact footprint.
See also:
KEY FEATURES
- For 75mm to 200mm wafer processing
- Up to 3 processing chambers
- Manual wafer load/unload
- Automated recipe execution
- Software and chambers same as SP4 and SP8 systems
MAJOR BENEFITS
- Economical entry to single-wafer processing
- Improved process quality and consistency
- Easy scale-up path to automated production
- Smallest Solstice system footprint
Smarter, easier surface prep process development
The Solstice® SP LT is a full-featured, easy-to-use process development tool for wafer surface preparation as well as ECD applications on 200mm and smaller substrates. The SP LT is engineered to deliver class-leading performance and exceptional operational flexibility. The unique Solstice platform enables it to handle a broad spectrum of surface preparation processes, from high-pressure metal lift-off to spray acid applications such as UBM etch, and much more. With the addition of an ECD chamber, it can perform plating processes, as well.
The Solstice SP LT features manual wafer loading and automated processing.
The Solstice SP LT accommodates up to three chambers for manual-load, semi-automated process development, or low-volume production. It may be configured with two chambers or two chambers plus one additional chamber on the side, which is the Solstice SP LT3.
All SP LT systems feature automated recipe execution and use the same software and controls and the same selection of chambers as the Solstice SP4 and SP8. This provides a natural, easy route for scaling up to automated production as the user expands capacity. No retraining is needed.
Streamlining your path to automated plating
The Solstice SP LT gives wet bench users an attractive and affordable entry point to the benefits of advanced, automated plating and surface preparation, with major improvements in consistency, throughput, and safety – all with state-of-the-art features and control in a very compact footprint.
