Trident SRD
Advanced Spin Rinse Dryers
For semiconductor batch processing
State-of-the-art SRDs
The Trident™ SRD Spin Rinse Dryers from ClassOne Technology provide state-of-the-art cleaning, rinsing, and drying of wafers after wet processing, for chemical or residue removal without leaving water spots or films. These tools utilize DI water rinse followed by N2 drying. The systems’ non-contact heating results in cleaner N2 because a filter is positioned after the heater to eliminate direct contact between the N2 and heater.
Choice of configurations
ClassOne’s SRDs are available in bench-top and roll-around single-stack units as well as dual-stack configurations – for processing up to 50 wafers per batch. These Trident SRDs accommodate wafer sizes up to 200mm, depending upon the model, bowl size, and rotor used.
- Trident 2800 – single-stack SRD
- Trident 4800 – single-stack SRD with roll around cart
- Trident 8800 – dual-stack SRD (shown above)
- Trident 8800HP – dual-stack SRD, able to use high-profile 200mm cassettes
(a) Ultra-pure non-contact N2 heater, (b) Facility panel controls all pressures and flows, (c) Ultra-pure fittings and valves
Precise control
Trident sprin rinse dryers use ultra-pure valves and fittings throughout, and all systems include a comprehensive facility panel to precisely control all pressures and flows. These are typical of the design advances and efficiencies that give Trident Spin Rinse Dryers their uniquely attractive performance-to-price value.
See also:
Key Features
- Uniform water spray
- Windows-based Solaris controller, color touch screen
- Precise control of flows and pressures
- Full wrap-around bowl heater
- Non-contact ultra-pure N2 heater
- Door-top DC ionizer
- Negative-pressure motor seal
- Stainless steel cabinetry
Major Benefits
- Uniform rinse, no nozzle replacement
- Optimum drying performance
- Much cleaner seal, reduced particles
- Cleaner N2
- FM4910 compliance
- All SRD components readily available
State-of-the-art SRDs
The Trident™ SRD Spin Rinse Dryers from ClassOne Technology provide state-of-the-art cleaning, rinsing, and drying of wafers after wet processing, for chemical or residue removal without leaving water spots or films. These tools utilize DI water rinse followed by N2 drying. The systems’ non-contact heating results in cleaner N2 because a filter is positioned after the heater to eliminate direct contact between the N2 and heater.
Choice of configurations
ClassOne’s SRDs are available in bench-top and roll-around single-stack units as well as dual-stack configurations – for processing up to 50 wafers per batch. These Trident SRDs accommodate wafer sizes up to 200mm, depending upon the model, bowl size, and rotor used.
- Trident 2800 – single-stack SRD
- Trident 4800 – single-stack SRD with roll around cart
- Trident 8800 – dual-stack SRD (shown above)
- Trident 8800HP – dual-stack SRD, able to use high-profile 200mm cassettes
(a) Ultra-pure non-contact N2 heater, (b) Facility panel controls all pressures and flows, (c) Ultra-pure fittings and valves
Precise control
Trident sprin rinse dryers use ultra-pure valves and fittings throughout, and all systems include a comprehensive facility panel to precisely control all pressures and flows. These are typical of the design advances and efficiencies that give Trident Spin Rinse Dryers their uniquely attractive performance-to-price value.
