High-Performance Single-Wafer Solutions

Cu RDL

High Rate Cu Pillar

Multi Metal Stack Pillar

UBM Etch

Solstice’s single-wafer wet etch capabilities offer precise, uniform seed and barrier layer removal.

Photoresist strip process micro image

Resist Strip

Metal lift off semiconductor process micro images

High Pressure MLO

Solstice supports precision solvent processes like photoresist strip and metal lift-off with faster, safer and cleaner single wafer process design.

RCA Cleans

Piranha (SPM)

With advanced single-wafer cleans, Solstice efficiently removes post-etch residues and contamination — critical for yield in compound and power devices.

Gold Via Liner

Gold Bond Pad

Solstice enables uniform, high-purity gold plating with tight uniformity and high step coverage — optimized for RF, sensor, and high-reliability applications.

High aspect ratio copper TSV fill plating

TSV

TGVs

Indium Plating

Hybrid Bonding

Glass interposers

From photonics to advanced sensors, Solstice’s configurable platform adapts quickly to new processes—accelerating development without sacrificing performance.