Fine Feature Gold Fill
Benefits:
- High plating rate and high uniformity
- Extremely uniform field profile
- Maximized bath life
- Seal reach aligns to existing integration
- Continuously cleaner chemistry
- Precise, consistent flow rate control
Technical Data:
| Plating Rate | Up to 0.5/minute (depend on chemistry and feature size) |
| Within-Wafer Uniformity | <2% |
| Within Feature Uniformity | <2% |
| Wafer-to-Wafer Uniformity | <2% |
| Step Coverage | 70-93% (depend on aspect ratio) |
| Roughness | <2kA |
Benefits:
- High plating rate and high uniformity
- Extremely uniform field profile
- Maximized bath life
- Seal reach aligns to existing integration
- Continuously cleaner chemistry
- Precise, consistent flow rate control
Technical Data:
| Plating Rate | Up to 0.5/minute (depend on chemistry and feature size) |
| Within-Wafer Uniformity | <2% |
| Within Feature Uniformity | <2% |
| Wafer-to-Wafer Uniformity | <2% |
| Step Coverage | 70-93% (depend on aspect ratio) |
| Roughness | <2kA |
Let’s Talk
We listen and respond to your unique challenges to provide the right technology at the right time and meet your manufacturing goals. Reach out, and we’ll deliver a solution.