Solstice LT
Semi-automated single-wafer process development with up to three chambers
Key Benefits
Up to 3 chambers: 2 ECD, or 2 ECD plus 1 vacuum prewet chamber
Economical entry to single-wafer processing
Easy scale-up path to automated production
Improved process quality and consistency
Smallest Solstice system footprint
LT3 available with vacuum pre-wet (VPW) for wetting
high aspect ratio features
Dimensions
Semi-automated single-wafer process development
with up to three chambers
The Solstice® LT is a full-featured, easy-to-use system for electroplating and surface preparation application, can process a broad range of wafer sizes down to 75mm. In addition to electroplating, the system can perform highpressure metal lift-off (MLO) spray and acid applications such as UBM etch, and more. The LT accommodates up to three chambers for manual-load, semi-automated process development, R&D, or low-volume production.
The systems use the same software and controls, and the same selection of chambers as the Solstice S4 and S8 configurations, providing an easy scale-up to automated production as capacity need expand.
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