Seed And Barrier Etch
Solstice can be configured for wet etch applications, including seed and barrier etch. The Solstice wet etch chamber with face-up SRD (spin rinse dry) allows for fast and uniform etching, combining the strength of face-down flood soak spray technology with fast and clean face-up drying. Additionally, end point detection can be used in certain film removal processes, allowing for automatic recipe correction and additional checks on process integrity.
Supported ClassOne process chambers include:
