Solstice S8
Advanced single-wafer electroplating and surface preparation, with up to eight chambers

Key Benefits
High plating rates, excellent throughput
Exceptional quality plating and surface prep
Special processing chambers can substantially reduce plating costs
Superior process control and excellent uniformity
Dimensions
Advanced single-wafer electroplating and surface preparation, with up to eight chambers
The Solstice® S8 is the most powerful, easy-to-use, and costefficient route to single-wafer volume production for many applications.
The S8 is engineered to deliver class-leading performance and exceptional operational flexibility. Its unique platform enables it to handle a spectrum of wet processes, from electroplating to high-pressure metal lift-off (MLO) to UBM etch and much more. The system is designed to accommodate many different substrate types, both transparent and opaque, from ultra thin to bonded. With its ability to deliver high-quality plating of a wide range of metals, the Solstice S8 can significantly reduce plating costs.
Solstice gives wet bench users an attractive, affordable, and easy upgrade path to the benefits of high-speed, cassetteto-cassette automated processing.

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