KOH Wet Etch
With Solstice® Systems
Typical KOH Wet Etch Performance
- Within-wafer uniformity: ≤3%
- Roughness: ≤10nm RMS
- Rate: 0.3µ/min
Typical KOH Wet Etch Performance
- Within-wafer uniformity: ≤3%
- Roughness: ≤10nm RMS
- Rate: 0.3µ/min
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We listen and respond to your unique challenges to provide the right technology at the right time and meet your manufacturing goals. Reach out, and we’ll deliver a solution.
